AVS 65th International Symposium & Exhibition
    Nanometer-scale Science and Technology Division Thursday Sessions
       Session NS-ThP

Paper NS-ThP14
Novel In-situ Diagnostic tools to Analyze Chemical Composition and Energy Spectrum of Vapor in Thin Film Deposition Process

Thursday, October 25, 2018, 6:00 pm, Room Hall B

Session: Nanometer-scale Science and Technology Division Poster Session
Presenter: Mikhail Strikovski, Neocera LLC
Authors: M.D. Strikovski, Neocera LLC
S.H. Kolagani, Neocera LLC
Correspondent: Click to Email

The device potential of multicomponent films in various electronic, magnetic and optical applications critically depends on (i) the chemical composition and (ii) the kinetic energy of the atomic species arriving at the film growth surface. We present two novel methods and instrumentation that allow analysis and control of both composition and energy spectrum of the deposition species. Pulsed Laser Deposition (PLD), a well-known deposition method for multi component materials has been chosen to demonstrate these in-situ diagnostics, providing researchers and engineers an immediate feedback in real-time.

The first tool, called Low Angle X-ray Spectrometer (LAXS), executes quantitative analysis of multiple X-ray spectra emitted by the film-substrate system under the impact of a high-energy electron beam. As the film thickness increases, LAXS follows the evolution of the x-ray spectrum dynamically, and applies special analytical algorithm to find film composition. To validate LAXS, we have chosen multi-elemental compound Y-Ba-Cu-O and demonstrated the efficiency of the technique in identifying the deposition conditions that result in the stoichiometric YBa2Cu3 cation composition needed for optimum superconducting properties. In another example using Zn-Ti-Cr continuous compositional spreads, LAXS provides a 2D- map of the resulting compositions that the user can correlate with the distribution of physical properties of interest.

The second tool is the Ion Energy Spectrometer (IES), a differential retarding field energy analyzer, which probes kinetic energy distribution of ions at the growth substrate. Depending on a number of system variables, actual energetics of ions arriving at the growth surface is a critical process parameter that needs careful optimizations. As an example, we analyze the energy spectrum of CeO2 as a function of oxygen partial pressure in a typical PLD case. Ions of energy as high as >100 eV are present, while majority of the ions are distributed in the 5 - 40 eV range. By varying oxygen background pressure, the IES spectrum is fine-tuned to have a spectral maximum at ≤10 eV- desirable for non-thermally activated, yet soft film growth. The IES also provides several operational modes, including quick acquisition of Time-Of-Flight spectrum.