| AVS 65th International Symposium & Exhibition | |
| Nanometer-scale Science and Technology Division | Friday Sessions |
| Session NS+AM+AS+MN+PC+PS+SS+TR-FrM |
| Session: | SPM – Probing Chemical Reactions at the Nanoscale |
| Presenter: | Christopher Goodwin, University of Delaware |
| Authors: | C.M. Goodwin, University of Delaware A.J. Maynes, Virginia Polytechnic Institute and State University Z.E. Voras, University of Delaware S.A. Tenney, Center for Functional Nanomaterials Brookhaven National Laboratory T.P. Beebe, University of Delaware |
| Correspondent: | Click to Email |
The use of silica as a substrate for polyaniline is highly appealing since silica is a common component in photovoltaics. To this end we have developed a vacuum technique for the deposition and functionalization of silica with aniline, without the need for wet chemistry. To study the chemistry of the reaction, X-ray Photoelectron Spectroscopy (XPS), Time-of-Flight Secondary Ion Mass Spectroscopy (TOF-SIMS), and Atomic Force Microscopy (AFM), among other techniques, have been used. To determine the electronic structure if the resulting films, scanning tunneling microscopy and evaluation of valance band data collected by XPS was performed. By controlling the temperature of the gas-phase reaction, two states of aniline were found to exist on the silica surface. Our interest is in determining how the two states affect the electronic band structure of the surface.