| AVS 65th International Symposium & Exhibition | |
| Electronic Materials and Photonics Division | Monday Sessions |
| Session EM+MP+PS-MoM |
| Session: | IoT Session: CMOS, Beyond the Roadmap and Over the Cliff |
| Presenter: | Tom Albrecht, Molecular Vista |
| Authors: | D. Nowak, Molecular Vista T. Albrecht, Molecular Vista |
| Correspondent: | Click to Email |
Area selective deposition (ASD) is an active area of research for advanced nanofabrication. Closely related to ASD is sequential infiltration synthesis (SIS) where inorganic material is infused into select polymer material to render an organic/inorganic hybrid material based on a polymer-template. The organic component can be burned or etched away to leave only the inorganic component, which can be used as etch mask or for other purposes. For lithography applications, the length scale (in nanometers range) and the nature of material (organic and inorganic molecules) are such that traditional techniques such as FTIR, electron microscopy, and X-ray scattering are not able to yield real space, chemically selective imaging of SIS processes. Photo-induced Force Microscopy (PiFM) [1] combines infrared (IR) absorption spectroscopy and atomic force microscopy (AFM) via illumination of the tip-sample junction with tunable IR laser light and mechanical detection of forces acting on the tip in response to absorption of light by the sample. By mapping the IR absorption of the sample as a function of IR wavelength and position, nm-scale resolution is achieved in displaying the locations of heterogeneous materials on the surface of a sample. This imaging capability is useful for investigating chemical pre-patterns as well as selectively deposited materials in area-selective processes like block copolymer directed self-assembly, SIS [2], and a variety of area-selective deposition techniques. In this talk, we will present the PiFM results on a model system: Al2O3 SIS using trimethyl aluminum and H2O with poly(styrene-block-methyl methacrylate) (PS-b-PMMA) block copolymer with 41 nm full pitch lamellae, demonstrating sub-10 nm spatial resolution of chemically selective imaging.
[1] D. Nowak et al., Sci. Adv. 2, e150157 (2016).
[2] Y. Tseng et al., J. Mater. Chem. 21, 11722(2011).