AVS 65th International Symposium & Exhibition
    Electronic Materials and Photonics Division Wednesday Sessions
       Session EM+AN+MI+SS-WeM

Paper EM+AN+MI+SS-WeM6
Unique Sensitivity to Deep Trap States Demonstrated by CREM of Broad Bandgap Dielectric Layers

Wednesday, October 24, 2018, 9:40 am, Room 101A

Session: Surface and Interface Challenges in Electronics and Photonics
Presenter: Hagai Cohen, Weizmann Institute of Science, Israel
Authors: H. Cohen, Weizmann Institute of Science, Israel
K.X. Steirer, Colorado School of Mines
Correspondent: Click to Email

Chemically resolved electrical measurements (CREM) present an efficient and sensitive means for studies of structural-electrical inter-relationships in heterostructures. Operated in-situ to x-ray photoelectron spectroscopy (XPS), the technique is yet far from being fully exploited. Recent progress in our CREM instrumentation has, however, opened new opportunities to which this report is dedicated. Using broad-bandgap dielectric layers, such as SiO2, SiON and ZnOS, we tested the CREM resolving power and sensitivity to charge trap states. These experiments yielded band diagrams with fine details on charge traps, which typically require the application of advanced optical techniques combined with the electrical characterization tools.

In addition, an intriguing process of doubly triggered conductance in ZnOS was observed. The ZnOS layers exhibited very poor conductance under either electrical or optical input signals, whereas simultaneous application of the two yielded extremely high sample currents. Based on the in-situ derived band diagram, a comprehensive explanation of the effect is provided. Moreover, we show how the CREM analytical tool can also provide a potential activator of future related devices.