| AVS 63rd International Symposium & Exhibition | |
| Thin Film | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | TF-FrM1 Assessing the Role of Temperature and Pressure on the Tungsten ALD Selectivity Window on Si/SiO2 Substrates Paul Lemaire, G.N. Parsons, North Carolina State University |
| 8:40am | TF-FrM2 X-ray Absorption Spectroscopy Study of Nanocomposite Thin Films Grown by Atomic Layer Deposition Anil Mane, S. Babar, A. Yanguas-Gil, Argonne National Laboratory, A. O'Mahony, Incom, Inc., T. Wu, J.W. Elam, Argonne National Laboratory |
| 9:00am | TF-FrM3 A Fundamental Study of Thermal Conductivity in ALD-deposited Amorphous Oxide Thin Films of Varying Density Brandon Piercy, Georgia Institute of Technology, K.E. Meyer, P.E. Hopkins, University of Virginia, M.D. Losego, Georgia Institute of Technology |
| 9:20am | TF-FrM4 The Development of ALD Barrier Layers for Harsh Environment Applications Ankit Singh, Georgia Institute of Technology, A. Perrotta, Eindhoven University of Technology, Netherlands, S. Graham, Georgia Institute of Technology |
| 9:40am | TF-FrM5 Conformal CVD Growth of HfBxCy and HfBxAly Hard Coatings with Low Coefficient of Friction and High Oxidation Resistance Elham Mohimi, T. Ozkan, S. Babar, Z. Zhang, S. Liu, G.S. Girolami, A.A. Polycarpou, J.R. Abelson, University of Illinois at Urbana Champaign |
| 10:00am | TF-FrM6 Chemical Vapor Deposition of Silanes for Surface Modification Brian Johnson, M.R. Linford, Brigham Young University |
| 10:20am | TF-FrM7 Iron CVD from Iron Pentacarbonyl: Growth Inhibition by CO Dissociation and Use of Ammonia to Restore Constant Growth P. Zhang, E. Mohimi, T. Talukdar, G.S. Girolami, John Abelson, University of Illinois at Urbana Champaign |
| 10:40am | TF-FrM8 New Insights on the Structure and Chemistry of the Tin Oxide-emitter Interface in CdTe Solar Cells as revealed by Thermomechanical Cleavage and Electron Spectroscopy Craig Perkins, C. Beall, J.M. Burst, A. Kanevce, M.O. Reese, T.M. Barnes, National Renewable Energy Laboratory |
| 11:00am | TF-FrM9 Defect Tolerance in Methylammonium Lead Triiodide Perovskite Xerxes Steirer, P. Schulz, G. Teeter, V. Stevanovic, M. Yang, K. Zhu, J.J. Berry, National Renewable Energy Laboratory |
| 11:20am | TF-FrM10 Non Uniform Deposition Rate Profile during the Growth of SiO2 Films Deposited by Atmospheric Pressure PECVD Anna Meshkova, FOM Institute DIFFER, Netherlands, F.M. Elam, S.A. Starostin, FUJIFILM Manufacturing Europe, Netherlands, M.C.M. van de Sanden, H.W. de Vries, FOM Institute DIFFER, Netherlands |
| 11:40am | TF-FrM11 X-Ray Diffraction from Pseudomorphic GaAs/In0.3Ga0.7As Superlattice High Electron Mobility Transistor Heterostructures on GaAs (001) Substrates Fahad Althowibi, J.E. Ayers, University of Connecticut |
| 12:00pm | TF-FrM12 Flexible CIGS Nanorod Array Photodetectors Emad Badradeen, M. Brozak, K.M. Al-Mayalee, F. Keles, T. Karabacak, University of Arkansas at Little Rock |