| AVS 63rd International Symposium & Exhibition | |
| Thin Film | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:40pm | TF+PS+SE-MoA1 Microcrystalline Silicon Thin Film Deposited by Tailored Voltage Waveform Plasmas using an SiF4/H2/Ar Chemistry and its Application to Photovoltaics Junkang Wang, LPICM, CNRS, École Polytechnique, Université Paris Saclay, France, M. Elyaakoubi, TFSC-Instrument, Palaiseau, France, E.V. Johnson, LPICM, CNRS, École Polytechnique, Université Paris Saclay, France |
| 2:00pm | TF+PS+SE-MoA2 Boron Carbide-Aromatic Composite Films by PECVD: A Novel Approach to Electron-hole Separation B. Dong, A. Oyelade, University of North Texas, E.M. Echeverria, University of Nebraska-Lincoln, Y-S. Jun, G.D. Stucky, University of California at Santa Barbara, P.A. Dowben, University of Nebraska-Lincoln, Jeffry Kelber, University of North Texas |
| 2:20pm | TF+PS+SE-MoA3 Impact of Pulsing the rf Power and the Precursor Injection on the Structure and Optical Properties of TiO2 and TiSiO Thin Films Deposited by PECVD Agnes Granier, S. Elisabeth, R. Michaud, N. Gautier, M. Richard Plouet, IMN, University of Nantes CNRS, France, M. Carette, IEMN CNRS/Université Lille 1, France, A. Goullet, IMN, University of Nantes CNRS, France |
| 2:40pm | TF+PS+SE-MoA4 Plasma CVD of Boron-Carbon Thin Films from Organoboron Precursors for Next Generation Neutron Detectors Mewlude(Maiwulidan) Imam (Yimamu), Linköping University, Sweden, C. Höglund, Linköping University and European Spallation Source ERIC, Sweden, R. Hall-Wilton, European Spallation Source ERIC, Sweden, J. Jensen, Linköping University, Sweden, S. Schmidt, Linköping University and European Spallation Source ERIC, Sweden, I.G. Ivanov, J. Birch, H. Pedersen, Linköping University, Sweden |
| 3:00pm | TF+PS+SE-MoA5 Plasma Enhanced Atomic Layer Deposition of Superconducting NbxTiyN Films Mark Sowa, Ultratech/CNT, Y. Yemane, J. Provine, Stanford University, E.W. Deguns, Ultratech/CNT, F. Prinz, Stanford University |
| 3:20pm | TF+PS+SE-MoA6 Mechanical Reliability of PECVD Barrier Films for Flexible Electronics Kyungjin Kim, A. Singh, H. Luo, T. Zhu, O. Pierron, S. Graham, Georgia Institute of Technology |
| 4:00pm | TF+PS+SE-MoA8 Origin of Stress in Sputtered CdTe and ZnS Films: Influence of Sputter Ion Mass on Mechanical and Chemical Layer Properties Ségolène Liénard, Univ. Grenoble Alpes, LTM CNRS, 38000 Grenoble, France, D. Sam-Giao, A. Kerlain, Sofradir, BP 21-38113, Veurey-Voroize, France, F. Boulard, C. Vallée, Univ. Grenoble Alpes, France |
| 4:20pm | TF+PS+SE-MoA9 Synthesis and Characterisation of MoB2-X and Mo-B-C Thin Films by Non-Reactive DC Magnetron Sputtering Paulius Malinovskis, Uppsala University, Sweden, J.P. Palisaitis, Linkoping University, Sweden, P.O.A. Persson, Linköping University, Sweden, E.L. Lewin, U.J. Jansson, Uppsala University, Sweden |
| 4:40pm | TF+PS+SE-MoA10 Molybdenum Back Contacts Deposited by High Power Impulse Magnetron Sputtering D.A. Loch, Arutiun Ehiasarian, Sheffield Hallam University, UK |
| 5:00pm | TF+PS+SE-MoA11 Plasma Characterization of Al and Cu with HIPIMS Jason Hrebik, Kurt J. Lesker Company, R. Bandorf, H. Gerdes, D. Spreemann, Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany |