| AVS 63rd International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS2-ThM1 Invited Paper Epitaxy of Doped Diamond for Electronics and Energy Applications Using Microwave Plasma CVD Robert Nemanich, F.A. Koeck, Arizona State University |
| 8:40am | PS2-ThM3 Magnetic Degradation of Perpendicular CoFeB Film caused by Hydrogen Plasma Masaki Yamada, Hitachi High-Technologies Corporation, Japan, M. Satake, Hitachi High-Technologies Corporation |
| 9:00am | PS2-ThM4 Roughness and Selectivity Trade Off during Patterning using Next Generation Resist Vinayak Rastogi, A. Ranjan, TEL Technology Center, America, LLC |
| 9:20am | PS2-ThM5 Fabrication of Large Superhydrophobic Surfaces with Hierarchical Structures on Polymer Films – Influence of the Roughening and the Fluorination Jérôme Durret, N. Frolet, C. Gourgon, CNRS - LTM, France |
| 9:40am | PS2-ThM6 Chlorine-based Etching of InP Laser : Effect of Plasma Chemistry on Sidewall Roughness and Damages Guillaume Gay, E. Pargon, C. Petit-Etienne, LTM - CEA/LETI, France, M. Brihoum, S. Barnola, CEA, LETI, MINATEC Campus, France, S. Labau, S. Arnaud, LTM - CEA/LETI, France |
| 11:00am | PS2-ThM10 Using a Dielectric Barrier Discharge (DBD) Device to Produce Proton Exchange Membranes at Atmospheric Pressure for PEMFC Technology Joffrey Baneton, D. Merche, Université Libre de Bruxelles, Belgium, G. Caldarella, N. Job, Université de Liège, Belgium, F. Reniers, Université Libre de Bruxelles, Belgium |
| 11:20am | PS2-ThM11 Laser-Enhanced Plasma Etching of Semiconductors and Metals Jason Peck, G.A. Panici, I.A. Shchelkanov, S. Hammouti, D.N. Ruzic, University of Illinois at Urbana-Champaign |
| 11:40am | PS2-ThM12 Highly Selective Isotropic Etching of Silicon in Preference to Germanium Christopher Ahles, A.C. Kummel, University of California, San Diego |
| 12:00pm | PS2-ThM13 Thermodynamic Prediction and Experimental Verification of Etch Selectivity for EUV Mask Materials Luke Minardi, N.D. Altieri, E.L. Chen, J.P. Chang, University of California Los Angeles |