| AVS 63rd International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | PS-ThA1 Invited Paper Nonthermal Plasma Driven Power to Gas Tomohiro Nozaki, Tokyo Institute of Technology, Japan |
| 3:00pm | PS-ThA3 Invited Paper Plasma-based CO2 Conversion: Experiments and Modeling A. Bogaerts, Ramses Snoeckx, University of Antwerp, Belgium |
| 4:00pm | PS-ThA6 Revisiting HgCdTe Etching Mechanism in High Density CH4-H2 Plasmas in Terms of Langmuir Adsorption Kinetics and Taking into Account Etching Inhibition Christophe Cardinaud, A. Pageau, CNRS - IMN, France, L. Le Brizoual, IETR - Univ. Rennes, France, F. Boulard, J. Baylet, CEA, LETI, MINATEC Campus, France |
| 4:20pm | PS-ThA7 Temporal Evolution of Surface Chemistry in Ion and Radical Dominated Etch of Hydrocarbon Polymers Barton Lane, P. Ventzek, N. Eibagi, Tokyo Electron America, Inc., A. Ranjan, V. Rastogi, TEL Technology Center, America, LLC |
| 4:40pm | PS-ThA8 Etching Mechanisms of Transparent Conducting Oxides by Hydrocarbon Plasmas Hu Li, Osaka University, Japan, P. Friederich, K. Fink, Karlsruhe Institut for Technology (KIT), K. Karahashi, Osaka University, M. Fukasawa, K. Nagahata, T. Tatsumi, Sony Corporation, Japan, W. Wenzel, Karlsruhe Institut for Technology (KIT), S. Hamaguchi, Osaka University, Japan |
| 5:00pm | PS-ThA9 The Role of the Dense Amorphous Carbon (DAC) Overlayer in Photoresist Etching Adam Pranda, Z. Tomova, S. Gutierrez Razo, J.T. Fourkas, G.S. Oehrlein, University of Maryland, College Park |
| 5:20pm | PS-ThA10 Transport Mechanism on Reactive Species in Downflow Reactors for F-based Etch Kenji Ishikawa, T. Tsutsumi, Y. Zhang, M. Sekine, T. Hayashi, M. Hori, Nagoya University, Japan, Y. Horiike, Tsukuba University, Japan |
| 5:40pm | PS-ThA11 Surface Reactions of Magnetic Materials by CO Cluster Beams Kazuhiro Karahashi, Osaka University, Japan, T. Seki, J. Matsuo, Kyoto University, Japan, K. Mizotani, K. Kinoshita, S. Hamaguchi, Osaka University, Japan |
| 6:00pm | PS-ThA12 A Method to Accelerate Creation of Plasma Etch Recipes Using Physics and Bayesian Statistics Meghali Chopra, R.T. Bonnecaze, The University of Texas at Austin |