| AVS 63rd International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS+TF-WeM1 Invited Paper Selective Cyclic Plasma Etching of Thin Films in Two Heating Way, Ion Bombardment and Infrared Irradiation. M. Izawa, Hitachi High-Technologies Corp., Japan, Kazunori Shinoda, N. Miyoshi, H. Kobayashi, Hitachi, Japan, N. Yasui, M. Tanaka, Y. Sonoda, K. Kuwahara, Hitachi High-Technologies Corp., Japan, K. Ishikawa, M. Hori, Nagoya University, Japan |
| 8:40am | PS+TF-WeM3 Concurrent Engineering of Atomic Layer Etch Patterning Processes Involving Oxide and Nitride Materials Mingmei Wang, P. Chan, TEL Technology Center, America, LLC, P. Ventzek, Tokyo Electron America, A. Ranjan, TEL Technology Center, America, LLC |
| 9:00am | PS+TF-WeM4 System Trade-offs of Atomic Layer Etching (ALE) of High Aspect Ratio 3D Features Chad Huard, University of Michigan, Y. Zhang, S. Sriraman, A. Paterson, Lam Research Corp., M.J. Kushner, University of Michigan |
| 9:20am | PS+TF-WeM5 Invited Paper Molecular Dynamics Simulations of Atomic Layer Etching Jun-Chieh Wang, S. Rauf, J.A. Kenney, L. Dorf, K.S. Collins, Applied Materials, Inc. |
| 11:00am | PS+TF-WeM10 Isotropic Atomic Layer Etching of Titanium Nitride Using Formation and Desorption of Ammonium Salt Kazunori Shinoda, N. Miyoshi, H. Kobayashi, M. Kurihara, Hitachi, Japan, S. Sakai, M. Izawa, Hitachi High-Technologies, Japan, K. Ishikawa, M. Hori, Nagoya University, Japan |
| 11:20am | PS+TF-WeM11 Organic Etchants Toward Atomic Layer Etching of Magnetic Metals Nicholas Altieri, L. Minardi, E.L. Chen, J.P. Chang, University of California Los Angeles |
| 11:40am | PS+TF-WeM12 Conformality of Thermal Al2O3 Atomic Layer Etching in High Aspect Ratio Structures Amy Marquardt, H. Sun, University of Colorado Boulder, S.M. George, University of Colorado at Boulder |
| 12:00pm | PS+TF-WeM13 Thermal Atomic Layer Etching of Crystalline Aluminum Nitride Using Sequential, Self-Limiting HF and Sn(acac)2 Reactions and Enhancement by H2 and Ar Plasmas Nicholas Johnon, H. Sun, K. Sharma, S.M. George, University of Colorado at Boulder |