AVS 63rd International Symposium & Exhibition
    In-Situ and Operando Spectroscopy and Microscopy for Catalysts, Surfaces, & Materials Focus Topic Thursday Sessions

Session IS-ThP
In-Situ and Operando Spectroscopy and Microscopy for Catalysts, Surfaces, & Materials Poster Session

Thursday, November 10, 2016, 6:00 pm, Room Hall D


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

IS-ThP3
Challenges and Current Progress in Characterizing the Solid Electrolyte Interface in Lithium-Sulfur Batteries
Manjula Nandasiri, A.M. Schwarz, V. Shutthanandan, Pacific Northwest National Laboratory, P. Kandasamy, Pusan National University, Republic of Korea, S.A. Thevuthasan, Qatar Environment and Energy Research Institute, V. Murugesan, Pacific Northwest National Laboratory
IS-ThP4
Traceable Calibration of High-Quality Pitch Standards Based on an Atomic Force Microscopy System Combined with a Piezo-Actuated Flexure Stage
Chien-ying Su, N.N. Chu, M.H. Shiao, C.N. Hsiao, F.Z. Chen, J.A. Yeh, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China
IS-ThP5
XPS Enables Visualization of Charge Screening in Metal-ionic Liquid Interfaces with Temporal- and Lateral-resolution
M.T. Camci, Mrs, Turkey, P. Aydogan, B. Ulgut, C. Kocabas, Sefik Suzer, Bilkent University, Turkey
IS-ThP6
Ambient Pressure Photoemission Instrumental Development and Applications within the Field of Energy Related Research
John Åhlund, Scienta Omicron, Sweden
IS-ThP7
Highly Sensitive Ion Trap Mass Spectrometer for Inline Process Control
G. Fedosenko, H.-Y. Chung, M. Aliman, A. Laue, R. Reuter, V. Derpmann, M. Antoni, L. Gorkhover, Tina Graber, Carl Zeiss SMT GmbH, Germany
IS-ThP8
Real-time State-resolved Reactivity Measurements as a Probe of Carbon Dissolution Kinetics on Ni(111)
Eric Dombrowski, E.H. High, A.L. Utz, Tufts University
IS-ThP9
Design and Performance of Large Surface Area Graphene Liquid Cell for in Situ Electron Spectroscopy and Microscopy
Hongxuan Guo, National Institute of Standards and Technology (NIST), A. Yulaev, A. Kolmakov, National Institute of Standards and Technology