| AVS 63rd International Symposium & Exhibition | |
| In-Situ and Operando Spectroscopy and Microscopy for Catalysts, Surfaces, & Materials Focus Topic | Thursday Sessions |
| Session IS-ThP |
| Session: | In-Situ and Operando Spectroscopy and Microscopy for Catalysts, Surfaces, & Materials Poster Session |
| Presenter: | Chien-ying Su, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China |
| Authors: | C.Y. Su, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China N.N. Chu, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China M.H. Shiao, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China C.N. Hsiao, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China F.Z. Chen, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China J.A. Yeh, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China |
| Correspondent: | Click to Email |
A high-precision atomic force microscope (AFM) metrology system has been established for traceable calibration of transfer standards based on a commercial AFM system and a piezo-actuated flexure stage. By adopting a DSP-based controller, this system is capable of providing high-level nanomotion control. The piezo-actuated flexure stage includes capacitive position sensors in all three axes for highly linear motions over 110 mm scan size and as low as one nanomenter out-of-plane motion. And the capability of subnanometer resolution with linearity error as less as 0.05% is achievable. For measuring periodical structures such as pitch standards, two operation modes are applicable: (a) Combined scanning mode, where the position of the closed-loop displacement stage is controlled point by point while the AFM scanner head measures and records the height variations simultaneously; (b) Direct scanning mode, where the closed-loop displacement stage actuates three axes offsets which are multiples of the pitch length according to the feedback signal of the AFM scanner head in order to locate edge profiles.
In addition, inductively coupled plasma reactive ion etching (ICP-RIE) process has been applied for high-quality pitch standard fabrication. System details, characteristics and results for pitch standard calibrations are presented. System calibrations through transfer standards such as 99.999 nm pitch standard with expanded uncertainties of 0.014 nm establish traceability to the national metrology institute Physikalisch-Technische Bundesanstalt ( PTB ). The estimated combined uncertainties of this system for pitch standard calibration are in accordance with the Guide to the Expression of Uncertainty in Measurement (ISO GUM).
Keywords: high-precision, transfer standards, nanomotion, flexure stage, feedback, ICP-RIE, combined uncertainties, metrology