| AVS 63rd International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
| Session TF-ThP |
| Session: | Thin Films Poster Session |
| Presenter: | Hung-Pin Chen, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China |
| Authors: | H.-P. Chen, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China W.H. Cho, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China C.-N. Hsiao, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan, Republic of China C.C. Lee, National Central University, Taiwan, Republic of China |
| Correspondent: | Click to Email |
Protected or enhanced aluminum is widely used for the preparation of highly reflective coatings in the DUV spectral range. For astronomical applications, the DUV reflector demand high quality on these coatings, not only with regard to their optical performance but also to their environmental stability, their thermal properties, and their radiation resistance. In this article, we prepare the protected aluminum mirrors by electron-beam evaporation with ion beam assisted, and optimize the beam voltage and beam current of ion source to improving film quality. Explore the refractive index, absorption and the microstructure by difference ion source parameters. The corresponding optical and mechanical properties of multilayer optical thin film were investigated by in-situ optical monitoring, spectrometer, ellipsometry, and Atomic Force Microscope (AFM). Space environment was partially simulated through the employment of a Co60 gamma (γ) radiation source (Nuclear Science and Technology Development Center), to determinate the optical stability of optical thin films for aerospace applications. The reflectance results were measured at the BL04B Beamline of National Synchrotron Radiation Research Center (Taiwan) in DUV spectral region.