AVS 63rd International Symposium & Exhibition | |
Plasma Science and Technology | Tuesday Sessions |
Session PS+2D-TuA |
Session: | Plasma Processing for Nanomaterials and 2D Materials |
Presenter: | Uwe Kortshagen, University of Minnesota |
Authors: | N.J. Kramer, University of Minnesota K. Schramke, University of Minnesota T. Chen, University of Minnesota H. Fu, University of Minnesota S. Ehrenberg, University of Minnesota K. Reich, University of Minnesota B. Shklovskii, University of Minnesota U.R. Kortshagen, University of Minnesota |
Correspondent: | Click to Email |
This presentation discusses the physics of plasma synthesis process. High photoluminescense quantum yields are achieved by careful surface functionalization through grafting alkene ligands to the nanocrystal surfaces. We also discuss the substitutional doping of silicon nanocrystals with boron and phosphorous using a nonthermal plasma technique. While the synthesis approach is identical in both cases, the activation behavior of these two dopants is found to be dramatically different. Finally, we present some experimental work on transport in films of highly phosphorous-doped nanocrystals, which indicates the approach to the metal-to-insulator transition.
This work was supported in part by the NSF Materials Research Science and Engineering Center under grant DMR-1420013, the DOE Energy Frontier Research Center for Advanced Solar Photophysics, and the Army Office of Research under MURI grant W911NF-12-1-0407.