AVS 63rd International Symposium & Exhibition
    Nanometer-scale Science and Technology Tuesday Sessions
       Session NS-TuA

Paper NS-TuA9
AFM Based Nanoscale Structure-Property Characterization of Nanoporous Organo-Silicates

Tuesday, November 8, 2016, 5:00 pm, Room 101D

Session: Nanoscale Imaging and Characterization
Presenter: Qichi Hu, Anasys Instruments
Authors: Q. Hu, Anasys Instruments
K. Kjoller, Anasys Instruments
G. Stan, NIST/Material Measurement Laboratory
S.W. King, Intel Corporation
Correspondent: Click to Email
The continued advancement of nanostructured materials and exploitation of nanoscale size effects will ultimately require understanding material structure-property relationships at nanometer length scales. Despite a plethora of metrologies capable of characterizing thermal, mechanical, electrical, and optical properties at the nanoscale, combined nanoscale chemical structure-property characterization has only recently become possible with the development of atomic force microscope based IR spectroscopy (ARM-IR). In this regard, we have combined AFM-IR chemical structure and contact resonance AFM (CR-AFM) mechanical property measurements in the investigation of 20 – 500 nm wide fin structures fabricated in a nanoporous organosilicate material. By combining these techniques, we have observed nanoscale modifications in the chemical structure and mechanical properties of the nanoporous fins that correlate with one another, the feature size, and fabrication process. This demonstration should lead the way for nanoscale chemical structure-property characterization of other materials systems where such relationships are deemed essential.