| AVS 63rd International Symposium & Exhibition | |
| Advanced Ion Microscopy Focus Topic | Wednesday Sessions |
| Session HI-WeA |
| Session: | 10 Years of GFIS Microscopy |
| Presenter: | Kyle Mahady, University of Tennessee |
| Authors: | K. Mahady, University of Tennessee P.D. Rack, University of Tennessee S. Tan, Intel Corporation R.H. Livengood, Intel Corporation Y. Greenzweig, Intel Corporation A. Raveh, Intel Corporation |
| Correspondent: | Click to Email |
In this talk, we will present an experimental and simulation based study of the evolution of nanostructures resulting from ion beam sputtering. We have updated our Monte-Carlo based code EnvizION, which simulates the sputtering and milling process for a variety of target compositions and structures. The computational efficiency of the updated code permits the simulation of more detailed physics in larger scale problems, with doses involving millions of ions and targets with hundreds of millions of atoms. In particular, we can now simulate milling in compound targets, as well as replacement of target atoms with impinging ions of single atom targets. We study the development of nanostructures in compound and single atom targets, and the evolution of the composition in the near surface region. Simulations of targets composed of SiO2 demonstrate preferential sputtering of oxygen, and associated enrichment of Si in the near surface region. For ion beams in targets composed of crystalline Si, we study the replacement of target Si atoms, and relate the amorphization of the the Si with the energy implanted due to the beam. Simulation results are compared with experiments.