| AVS 63rd International Symposium & Exhibition | |
| Advanced Ion Microscopy Focus Topic | Thursday Sessions |
| Session HI+MI+NS-ThA |
| Session: | Ion Beam Based Imaging and Nanofabrication |
| Presenter: | Alexei Belianinov, Oak Ridge National Laboratory |
| Authors: | A. Belianinov, Oak Ridge National Laboratory A. Ievlev, Oak Ridge National Laboratory V. Iberi, Oak Ridge National Laboratory H. Hysmith, Oak Ridge National Laboratory M.A. Susner, Oak Ridge National Laboratory M. McGuire, Oak Ridge National Laboratory S. Jesse, Oak Ridge National Laboratory S.V. Kalinin, Oak Ridge National Laboratory O.S. Ovchinnikova, Oak Ridge National Laboratory |
| Correspondent: | Click to Email |
Manipulating matter at progressively finer and ultimately atomic scales enables new functionality and effectively drives nanoscience. Currently, well understood, robust resist-based lithography, carries the brunt of nanofabrication, however local electron, ion and physical probe methods are improving as well, driven largely in part of their ability to fabricate without multi-step preparation processes that contaminate the sample with processing resists and solvents. Furthermore probe based methods extend beyond nanofabrication to nanomanipulation and imaging, vital ingredients to rapid transition to testing and manufacturing of layered 2D heterostructured devices.
In this work we demonstrate chemical and physical changes induced by a helium ion beam in a Helium Ion Microscope (HIM) with the surface of bulk copper indium thiophosphate (CITP) CuMIIIP2X6 (M = Cr, In; X= S, Se) library of compounds of varying copper concentration; from 4–100%. Physical changes in micro- and nano-fabrication are explored via Atomic Force Microscopy, (AFM), and chemical changes are probed by Secondary Ion Mass Spectrometry, (SIMS). Our work illustrates controlled loss of ferrielectric domains, and nanostructure growth with material volumes scaling to the dosage of the helium ion beam. The nanostructures are oxygen rich, sulfur poor, with the copper concentration virtually unchanged. Effects of varying copper concentration on the quality of the fabricated nanostructures, as well as the differences in their chemical make-up will be discussed.
Acknowledgements
Research was supported (A. B., V. I., A. I., H. H., S. J. S. V. K. O. S. O) and partially conducted (AFM, HIM, SIMS) at the Center for Nanophase Materials Sciences, which is sponsored at Oak Ridge National Laboratory by the Scientific User Facilities Division, Office of Basic Energy Sciences, US Department of Energy. This work was also supported (M. S., M. M.) and partially conducted (material growth) by the U.S. Department of Energy, Basic Energy Sciences, Materials Sciences and Engineering Division.