| AVS 63rd International Symposium & Exhibition | |
| Advanced Ion Microscopy Focus Topic | Thursday Sessions |
| Session HI+MI+NS-ThA |
| Session: | Ion Beam Based Imaging and Nanofabrication |
| Presenter: | Lucille Giannuzzi, EXpressLO LLC |
| Correspondent: | Click to Email |
The focused ion beam (FIB) ex situ lift out (EXLO) technique was the first lift out technique developed for transmission electron microscopy (TEM), surface science, and other site specific analysis of materials [1,2]. EXLO is well known for its ease, speed, and reproducibility, and is perfectly suited for manipulation of thick or electron transparent thin specimens for site specific microscopy or analytical characterization. EXLO is also perfectly suited for manipulation of electron transparent specimens to MEMS carrier devices used for in situ TEM holders. Micromanipulation techniques also aid in specimen preparation for particulates and fibers that require subsequent FIB milling. A review of EXLO and advances of the technique using a new slotted grid specimen carrier will be presented. This new grid negates the need for a carbon film specimen support and allows for additional specimen FIB milling or other post processing after manipulation [3].
[1] L.A. Giannuzzi et al., Mat. Res. Soc. Symp. Proc. 480 (1997) 19-27.
[2] F.A. Stevie et al., Surf. Interface Anal. 31 (2001) 345–351.
[3] L.A. Giannuzzi et al., Microsc. Microanal. 21 (2015) 1034-1048.