AVS 63rd International Symposium & Exhibition | |
Advanced Ion Microscopy Focus Topic | Thursday Sessions |
Session HI+MI+NS-ThA |
Session: | Ion Beam Based Imaging and Nanofabrication |
Presenter: | Gregor Hlawacek, Helmholtz-Zentrum Dresden Rossendorf, Germany |
Authors: | G. Hlawacek, Helmholtz-Zentrum Dresden Rossendorf, Germany L. Sottili, Helmholtz-Zentrum Dresden Rossendorf, Germany M. Engler, Helmholtz-Zentrum Dresden Rossendorf, Germany S. Facsko, Helmholtz-Zentrum Dresden Rossendorf, Germany |
Correspondent: | Click to Email |
Here, we present for the first time ripple patterns that have been created on the GaAs(001) surface using 5 keV Ne ions and elevated temperatures of up to 600 K in a Helium Ion Microscope (HIM). We will present the home built sample heater that can be loaded through the load lock of the Carl Zeiss Orion NanoFab and describe the influence on the device performance, as well as HIM operation at 5 keV.
The evolution of the ripple wavelength changes from 30 nm at low 1e17 Ne/cm² to 80 nm at 1e18 Ne/cm². The orientation of the ripples with respect to the shape can be changed by rotating the pattern on the surface and the influence of the geometrical constrains of the irradiated area on the ripple pattern is studied.