AVS 63rd International Symposium & Exhibition
    Electronic Materials and Photonics Thursday Sessions
       Session EM+AC+SS+TF-ThM

Paper EM+AC+SS+TF-ThM3
Improved p–n Heterojunction Device Performance Induced by Irradiation in Amorphous Boron Carbide Films

Thursday, November 10, 2016, 8:40 am, Room 102A

Session: Radiation Detection Materials and Devices
Presenter: George Peterson, University of Nebraska - Lincoln
Authors: G.G. Peterson, University of Nebraska - Lincoln
Q. Su, University of Nebraska - Lincoln
Y. Wang, Los Alamos National Laboratory
P.A. Dowben, University of Nebraska - Lincoln
M. Nastasi, University of Nebraska - Lincoln
Correspondent: Click to Email

Amorphous hydrogenated boron carbide films (a-B10C2+x:Hy) on Si p–n heterojunctions were fabricated utilizing plasma enhanced chemical vapor deposition (PECVD). These devices were found to be robust when irradiated with 200 keV He+ ions. For low doses of irradiation, contrary to most other electrical devices, the electrical performance improved. On the heterojunction I(V) curve, reverse bias leakage current decreased by 3 orders of magnitude, series resistance across the device decreased by 64%, and saturation current due to generation of electron–hole pairs in the depletion region also decreased by an order of magnitude. It is believed that the improvements in the electrical properties of the devices are due to an initial passivation of defects in the a-B10C2+x:Hy film resulting from electronic energy deposition, breaking bonds and allowing them to reform in a lower energy state, or resolving distorted icosahedron anion states.