| AVS 62nd International Symposium & Exhibition | |
| In-Situ Spectroscopy and Microscopy Focus Topic | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | IS+AS+SA+SS-MoA1 Invited Paper In situ Electron Spectroscopy for Energy Science Robert Schlögl, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Germany |
| 3:00pm | IS+AS+SA+SS-MoA3 Catalysis on Singly Dispersed Bimetallic Sites on Oxide Support Luan Nguyen, University of Kansas, A. Frenkel, Yeshiva University, J. Li, Tsinghua University, China, F. Tao, University of Kansas |
| 3:20pm | IS+AS+SA+SS-MoA4 Oxidation and Recovery of WC Thin Film Surfaces E. Monazami, University of Virginia, J.B. McClimon, University of Pennsylvania, N. Johansson, P. Shayesteh, S. Urpelainen, J. Schnadt, Lund University, Sweden, Petra Reinke, University of Virginia |
| 3:40pm | IS+AS+SA+SS-MoA5 Invited Paper Microscopy, Spectroscopy, and Reactivity of Surfaces in Vacuum and under Ambient Reaction Pressures Miquel Salmeron, B. Eren, Lawrence Berkeley National Laboratory |
| 4:20pm | IS+AS+SA+SS-MoA7 Novel Solutions for Ambient Pressure and In Situ Photoelectron Spectro-Microscopy Hikmet Sezen, M. Amati, L. Gregoratti, Elettra-Sincrotrone Trieste, Italy |
| 4:40pm | IS+AS+SA+SS-MoA8 In Situ Studies of Partial Oxidation of Methanol to Hydrogen on Isolated Bimetallic Site Pt1Znn Shiran Zhang, L. Nguyen, University of Kansas, A. Frenkel, Yeshiva University, J. Liu, Arizona State University, F. Tao, University of Kansas |
| 5:00pm | IS+AS+SA+SS-MoA9 New Developments in Small Spot and Imaging Near Ambient Pressure XPS Andreas Thissen, SPECS Surface Nano Analysis GmbH |
| 5:20pm | IS+AS+SA+SS-MoA10 In Situ Measurement of the Abundances and Temperatures of the Constituents of Semiconductor Manufacturing Plasmas via Terahertz Absorption Spectroscopy: Comparison with Theoretical Models Yaser Helal, C.F. Neese, F.C. De Lucia, The Ohio State University, A. Agarwal, B. Craver, P.R. Ewing, P.J. Stout, M.D. Armacost, Applied Materials, Inc. |