| AVS 62nd International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
| Session PS+2D+SE-WeM |
| Session: | Plasma Diagnostics, Sensors and Control II |
| Presenter: | Yuchen Yang, Lawrence Berkeley Lab, University of California, Berkeley |
| Authors: | Y. Yang, Lawrence Berkeley Lab, University of California, Berkeley X. Zhou, Lawrence Berkeley Lab, University of California, Berkeley A. Anders, Lawrence Berkeley Lab, University of California, Berkeley |
| Correspondent: | Click to Email |
Research has been done for copper and chromium targets in conventional non-reactive HiPIMS, revealing the disappearance of localized ionization zones when operating at high power due to high metal neutral supply from the target. However, relatively little research has been done for reactive HiPIMS. In this work we investigate the existence of ionization zones in various forms of reactive magnetron sputtering: direct current (dc) and HiPIMS for conventional pulse patterns and in burst mode. Copper and chromium targets are selected with nitrogen as reactive gas because (i) in the non-reactive regime Cu and Cr can be operated with or without ionization zones, and (ii) these target materials form application-relevant compound films, e.g. of interest in wear and corrosion-resistant applications, medical implants, metallization layers, etc.
Work at LBNL is supported by the U.S. Department of Energy under Contract No. DE-AC02-05CH11231.