| AVS 62nd International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
| Session PS+2D+SE-WeM |
| Session: | Plasma Diagnostics, Sensors and Control II |
| Presenter: | JonTomas Gudmundsson, University of Iceland |
| Authors: | J.T. Gudmundsson, University of Iceland D. Lundin, Université Paris-Sud, France N. Brenning, KTH Royal Institute of Technology, Sweden T. Minea, Université Paris-Sud, France |
| Correspondent: | Click to Email |
region model (IRM) [2] of the reactive Ar/O2 HiPIMS discharge with a titanium target that was developed to study the temporal behavior of the discharge plasma parameters. We explore the influence of oxygen dilution on the discharge properties such as electron density, the ionization fraction of the sputtered vapour, the oxygen dissociation fraction and the onset and role of self sputtering. We discuss the important processes and challenges for more detailed modeling of the reactive HiPIMS discharge. Furthermore, we discuss experimental observations during reactive high power impulse magnetron sputtering sputtering (HiPIMS) of Ti target in Ar/N2 and Ar/O2 atmosphere. The discharge current waveform is highly dependent on the reactive gas flow rate, pulse repetition frequency and discharge voltage. The discharge current increases with decreasing repetition frequency. This we attribute to an increase in the effective secondary electron emission yield during the self-sputtering phase of the pulse, as nitride [3] or oxide [4] forms on the target.
[1] J. T. Gudmundsson, N. Brenning, D. Lundin and U. Helmersson, J. Vac. Sci. Technol. A, 30 030801 (2012)
[2] M. A. Raadu, I. Axnäs, J. T. Gudmundsson, C. Huo and N Brenning, Plasma Sources Science and Technology, 20 065007 (2011) 065007
[3] F. Magnus, O. B. Sveinsson, S. Olafsson and J. T. Gudmundsson, J. Appl. Phys., 110 083306 (2011)
[4] F. Magnus, T. K. Tryggvason, S. Olafsson and J. T. Gudmundsson, J. Vac. Sci. Technol., 30 (2012) 050601