AVS 62nd International Symposium & Exhibition
    Helium Ion Microscopy Focus Topic Thursday Sessions
       Session HI+AS+NS-ThA

Paper HI+AS+NS-ThA10
Multi-Beam Ion Microscopy and Nanofabrication at UC Berkeley

Thursday, October 22, 2015, 5:20 pm, Room 211B

Session: Imaging and Milling with He and Ne Ion Beams
Presenter: Frances Allen, UC Berkeley, Lawrence Berkeley National Laboratory (LBNL), Biomolecular Nanotechnology Center/QB3
Authors: F.I. Allen, UC Berkeley, Lawrence Berkeley National Laboratory (LBNL), Biomolecular Nanotechnology Center/QB3
P. Lum, Biomolecular Nanotechnology Center/QB3
T.C. Pekin, UC Berkeley and LBNL
Z.J. Wang, UC Berkeley and Xi’an Jiaotong University, Republic of China
R. Thayer, UC Berkeley
J. Hong, UC Berkeley and LBNL
A.A. Omrani, UC Berkeley
M.F. Crommie, UC Berkeley and LBNL
J. Bokor, UC Berkeley and LBNL
N.H. Patel, UC Berkeley
A.M. Minor, UC Berkeley and LBNL
P. Hosemann, UC Berkeley
Correspondent: Click to Email

A Zeiss Orion NanoFab Helium Ion Microscope (HIM) has recently been installed at UC Berkeley in the Biomolecular Nanotechnology Center. The specialized gas-field ion source is operated using He or Ne gas and a separate column with a liquid-metal ion source is used to generate a Ga+ beam. Thus, the advanced imaging and nanofabrication capabilities of the HIM using He+ and Ne+ can be combined with the bulk milling capability of Ga+ enabling a range of imaging and nanofabrication modalities all in one tool.

We will present a selection of initial results from the microscope, highlighting the versatility of this multi-beam instrument and a close collaboration with Transmission Electron Microscopy (TEM) facilities at the National Center for Electron Microscopy in the Molecular Foundry of Lawrence Berkeley National Laboratory for the characterization of NanoFab-fabricated electron-transparent specimens. For example, using Ne+ and Ga+ beams and subsequent TEM analysis we explore the effect of Ne+ milling versus conventional Ga+ milling of TEM specimens focusing on aluminum alloys and their nanomechanical properties. We use the He+ beam to selectively implant Ga+-milled nanopillars for TEM investigation of He-bubble superlattices and in situ TEM nanomechanical testing for a range of implantation doses. Further applications combining fine milling with high-resolution HIM imaging include the fabrication of magnetic multilayer tunnel junction island structures down to a diameter of <10nm, fabrication of MoS2 nanoribbons, and site-specific cross-sectioning of scales from the wing of the Junonia coenia butterfly species for investigations of the development of nanostructures responsible for structural color. In many applications the use of the electron flood-gun for charge compensation when imaging insulating specimens is a crucial component.