| AVS 61st International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | TF-ThA1 Invited Paper Enhancing Water Desalination Membranes by Initiated Chemical Vapor Deposition (iCVD) Karen Gleason, Massachusetts Institute of Technology |
| 3:00pm | TF-ThA3 Pulsed Plasma Enhanced Chemical Vapor Deposition for Nanoscale Control of the Size, Shape and Surface Properties of Asymmetric Membranes Sanket Kelkar, D. Chiavetta, C.A. Wolden, Colorado School of Mines |
| 3:20pm | TF-ThA4 A Combined Microstructure Characterization of Moisture Permeation Barrier Layers by Means of Electrochemical Impedance Spectroscopy and Ellipsometric Porosimetry Alberto Perrotta, Eindhoven University of Technology; Dutch Polymer Institute (DPI), Netherlands, S.J. García, Delft University of Technology, Netherlands, J.J. Michels, Holst Centre / TNO, Netherlands, W.M.M. Kessels, M. Creatore, Eindhoven University of Technology, Netherlands |
| 4:00pm | TF-ThA6 Influence of Surface Topography and Defects on the Performance of Nanoscale Thin Film Moisture Permeation Barriers Sean King, D. Jacob, B. Colvin, D. Vanleuven, J. Kelly, Intel Corporation |
| 4:20pm | TF-ThA7 Atomic Layer Deposition for Encapsulation and Barriers F. van den Bruele, F. Grob, Paul Poodt, Holst Centre / TNO, Netherlands |
| 4:40pm | TF-ThA8 Lifetime of Atomic Layer Deposited Al2O3 and Parylene Bilayer Encapsulation for Passive and Active Neural Interfaces Loren Rieth, R. Caldwell, X. Xie, F. Solzbacher, University of Utah |
| 5:00pm | TF-ThA9 Influence of Polymer Microstructure and Process Temperature on the Formation of Tailored ALD Coatings on Polymers R.P. Padbury, Jesse Jur, North Carolina State University |
| 5:20pm | TF-ThA10 Mechanisms of Moisture and Oxygen Transport through Thin Silica-like Barrier Films Deposited in Atmospheric Pressure Dielectric Barrier Discharge Sergey Starostin, FOM Institute DIFFER, Netherlands, B.C.A.M. van der Velden-Schuermans, S. Quan, FUJFILM Manufacturing Europe b.v., Netherlands, A. Meshkova, M.C.M. van de Sanden, H.W. de Vries, FOM Institute DIFFER, Netherlands |
| 5:40pm | TF-ThA11 Scale Dependent Surface Energies Influence Wetting Behaviour on Ultimately Small Topographies Jan Knauf, Advanced Molecular Films GmbH and RWTH Aachen University, Germany, L. Reddemann, Advanced Molecular Films GmbH and Universität zu Köln, Germany, K. Cheng, AMF GmbH, Germany, A. Böker, DWI-Leibniz-Institute for Interactive Materials, RWTH Aachen University; Lehrstuhl für Makromolekulare Materialien und Oberflächen, RWTH Aachen University, Germany, K. Reihs, Advanced Molecular Films GmbH, Germany |