| AVS 61st International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
| Session TF-ThA |
| Session: | Thin Film for Permeation Barriers and Membranes |
| Presenter: | Jesse Jur, North Carolina State University |
| Authors: | R.P. Padbury, North Carolina State University J.S. Jur, North Carolina State University |
| Correspondent: | Click to Email |
Atomic layer deposition is a technique that is able to integrate nanoscale inorganic coatings to organic polymers. Through this process a number of different inorganic coating morphologies are able to form during ALD nucleation on a wide variety of polymers. In this work, we provide a systematic analysis of the ALD nucleation characteristics on polymers by investigating the influence of polymer microstructure and ALD process temperature. Specifically, in-situ quartz crystal microgravimetry is employed to understand the nucleation behavior of trimethyl aluminum (TMA) in a series of polyesters and poly-n-methacrylates. The data indicates that the glass transition temperature of the polymer, as influenced by variations in microstructure and process temperatures, has a significant impact on the absorption/desorption characteristics during TMA/water exposures. Finally, we propose potential growth mechanisms and demonstrate adjustments to the ALD process parameters that enable the ability to produce a customized interface for ALD materials growth on polymer substrates.