| AVS 61st International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF+PS-ThM1 Invited Paper Industrializing Single Wall Carbon Nanotubes by Water-Assisted CVD Don Futaba, AIST, Japan |
| 8:40am | TF+PS-ThM3 Organoboranes as Single Precursors for Low Temperature CVD of Boron Carbide Thin Films for Neutron Detectors M. Imam, Linköping University, Sweden, C. Höglund, European Spallation Source (ESS AB), J. Birch, Henrik Pedersen, Linköping University, Sweden |
| 9:00am | TF+PS-ThM4 High-Quality ZnO Thin Films Grown by a New CVD Method using Catalytically-generated High-energy Precursors T. Nakamura, Y. Ohashi, N. Yamaguchi, E. Nagatomi, T. Kato, Kanji Yasui, Nagaoka University of Technology, Japan |
| 9:20am | TF+PS-ThM5 Filling High Aspect Ratio Features: A Ballistic Transport Model Wenjiao Wang, J.R. Abelson, University of Illinois at Urbana-Champaign |
| 9:40am | TF+PS-ThM6 Ozone Pretreatment’s Effect on Infiltration of Carbon Nanotube Forests Richard Vanfleet, L. Barrett, J. Rowley, K. Hinton, R.C. Davis, D.D. Allred, Brigham Young University |
| 11:00am | TF+PS-ThM10 A Novel Gap Fill Technology to Address the Current and Future Scaling Challenges of the Semiconductor Industry A. Mallick, Jingmei Liang, B. Underwood, K. Thadani, N. Ingle, T. Mandrekar, Applied Materials Inc. |
| 11:20am | TF+PS-ThM11 Comparison of Carbonaceous Thin Films Deposited on Ru-capped Multilayer Mirrors via Extreme-Ultraviolet Light and Electrons Michael Barclay, Johns Hopkins University, N.S. Faradzhev, S.B. Hill, T.B. Lucatorto, National Institute of Standards and Technology (NIST), D.H. Fairbrother, Johns Hopkins University |
| 11:40am | TF+PS-ThM12 Production and Characterization of Thin Film Group IIIB, IVB and Rare Earth Hydrides by Reactive Evaporation James Provo, J.L. Provo Consulting |
| 12:00pm | TF+PS-ThM13 Cathodic Cage Plasma Deposition of TiN and TiO2 Thin Films on Silicon Substrate R.R.M. de Sousa, IFPI, Brazil, P.S. Sato, UFSCar, Brazil, B.C. Viana, UFPI, Brazil, C. Alves Jr, UFRSA, Brazil, A. Nishimoto, Kansai University, Japan, Pedro Nascente, UFSCar, Brazil |