| AVS 61st International Symposium & Exhibition | |
| Plasma Science and Technology | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS2-FrM1 Enhancement of Surface Migration by Photoemission-assisted Plasma for Atomic-Scale Surface Smoothing A. Saijian, Y. Kotanikawa, Y. Ohtomo, Shuichi Ogawa, Y. Takakuwa, Tohoku University, Japan |
| 8:40am | PS2-FrM2 Silicon Etching using CW, Synchronized Pulsed and Bias Pulsed Cl2 Plasma Odile Mourey, G. Cunge, C. Petit-Etienne, M. Darnon, P.D. Brichon, E. Despiau-Pujo, E. Latu-Romain, O. Joubert, LTM - MINATEC - CEA/LETI, France |
| 9:00am | PS2-FrM3 Utilizing Absorption, Emission, and Fluorescence Spectroscopies to Elucidate the Energetics of Plasma-Surface Interactions J.M. Blechle, R.B. Davidson, E.J. Sutor, Ellen Fisher, Colorado State University |
| 9:20am | PS2-FrM4 Transmission of Plasma-Generated Free Radicals through Dielectric Films Faraz Choudhury, G. Sabat, University of Wisconsin-Madison, Y. Nishi, Stanford University, J.L. Shohet, University of Wisconsin-Madison |
| 9:40am | PS2-FrM5 Invited Paper Gas-Phase Chemistry and Plasma Surface Interactions Matthew Goeckner, University of Texas at Dallas |
| 10:40am | PS2-FrM8 Plasma Induced Roughness Formation on Photoresist Examined by HBr Plasma-Beam Etching Y. Zhang, Makoto Sekine, K. Ishikawa, K. Takeda, H. Kondo, M. Hori, Nagoya University, Japan |
| 11:00am | PS2-FrM9 Novel Gases for Obtaining High Etch Selectivity of Oxide to Nitride for Contact Etch Vijay Surla, L. Daniel, R. Gupta, V. Pallem, Air Liquide |
| 11:20am | PS2-FrM10 Dielectric Barrier Discharges: Statistical Analysis of Discrete Filaments and Multi-filament Dynamics Floran Peeters, R.F. Rumphorst, Eindhoven University of Technology, Netherlands, M.C.M. van de Sanden, FOM institute DIFFER, Netherlands |
| 11:40am | PS2-FrM11 Single Step Conversion of Metal/Polymer Films to Flexible, Electrically Conductive Patterns by a Scanning Atmospheric-Pressure Microplasma Process Souvik Ghosh, R. Yang, A.C. Barnes, S. Rowan, C.A. Zorman, P.X.-L. Feng, R.M. Sankaran, Case Western Reserve University |