| AVS 61st International Symposium & Exhibition | |
| Plasma Science and Technology | Friday Sessions |
| Session PS2-FrM |
| Session: | Plasma Surface Interactions II |
| Presenter: | Matthew Goeckner, University of Texas at Dallas |
| Correspondent: | Click to Email |
Plasmas have been used extensively in the semiconductor industry for almost half a century. However as processing has reached the production of nano-scale devices, development of industrially viable processes have become more difficult. In part this is because of all of the free parameters that exist in such plasmas. To overcome this economic issue, tool vendors and semiconductor companies have turned to complex computational models of processing plasmas. The accuracy of those models requires a thorough understanding of the links between gas-phase chemistry and surface processes. In this talk, we will give a brief overview of what is known about the links between the gas-phase chemistry and surface processes and what still needs to be understood.
This material is based upon work supported by the National Science Foundation under Grants CBET0078669, CBET0922962 and IIP1338917. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.