| AVS 61st International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | PS-WeA1 Diagnostics of Cl2/O2 Inductively-Coupled Plasmas by Ultra-High Sensitivity Broad-Band Absorption Spectroscopy Mickaël Foucher, LPP-CNRS, Ecole Polytechnique, France, E. Carbone, LTM - MINATEC - CEA/LETI, France, J.-P. Booth, LPP-CNRS, Ecole Polytechnique, France |
| 2:40pm | PS-WeA2 Diagnostics in Pulsed Hydrogen Plasmas Jerome Dubois, G. Cunge, LTM - CEA/LETI, France, N. Posseme, CEA-LETI, France, M. Darnon, LTM - CEA/LETI, France, L. Vallier, CNRS-LTM, France, O. Joubert, LTM - CEA/LETI, France |
| 3:00pm | PS-WeA3 Invited Paper The Role of Diagnostics in Plasma Etch Reactors in Enabling the Information Age Alex Paterson, J. Holland, S. Sriraman, E. Hudson, H. Singh, V. Vahedi, Lam Research Corp |
| 4:20pm | PS-WeA7 Ion Angular Distributions Measured with a Planar Retarding Field Analyzer Shailesh Sharma, Impedans Ltd., Ireland |
| 4:40pm | PS-WeA8 Quantitative Analysis of Neutral Species Generated in Styrene Low Pressure RF Plasma, as a Function of Plasma Power X. Gillon, J.-J. Jean-Jacques, Laurent Houssiau, University of Namur, Belgium |
| 5:00pm | PS-WeA9 Comparison of Commercial Plasma Probe Systems Valery Godyak, RF Plasma Consulting, B.M. Alexandrovich, Plasma Sensors |
| 5:20pm | PS-WeA10 Systematic Diagnostic Approach for Fabricating High Quality SiNx:H Film using UHF Assisted Capacitively Coupled Plasma Source J.G. Han, B.B. Sahu, Kyung S. Shin, Sungkyunkwan University, Republic of Korea, K. Ishikawa, M. Hori, Nagoya University, Japan |
| 5:40pm | PS-WeA11 Electron Beam Generated Plasmas in Fluorine Chemistries David Boris, R.F. Fernsler, G.M. Petrov, Tz.B. Petrova, S.G. Walton, Naval Research Laboratory |
| 6:00pm | PS-WeA12 Characterization of Hydrogen Recombination at the Wall and its Effect on Hydrogen Source Performance Shaun Smith, MKS Instruments, Inc. |