AVS 61st International Symposium & Exhibition | |
Materials Characterization in the Semiconductor Industry Focus Topic | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | MC+AP+AS-MoM1 Invited Paper Dopant/Carrier and Compositional Profiling for 3D-Structures and Confined Volumes. Wilfried Vandervorst, A. Kumar, J. Demeulemeester, A. Franquet, P. Eyben, J. Bogdanowicz, M. Mannarino, A. Kambham, U. Celano, IMEC, KU Leuven Belgium |
9:00am | MC+AP+AS-MoM3 Characterization of the Periodicity (Pitch) and Stress of Transistor Fin Structures using X-Ray Diffraction Reciprocal Space Mapping Alain Diebold, M. Medikonda, SUNY College of Nanoscale Science and Engineering, M. Wormington, Jordan Valley Semiconductors Inc |
9:20am | MC+AP+AS-MoM4 MBE Grading Techniques for the Growth of InAsSb Films with Inherent Properties Unaffected by Strain Wendy Sarney, S.P. Svensson, US Army Research Laboratory, Y. Lin, D. Wang, L. Shterengas, D. Donetsky, G. Belenky, Stony Brook University |
9:40am | MC+AP+AS-MoM5 Quantitative 3-D Imaging of Filaments in Hybrid Resistive Memory Devices by Combined XPS and ToF-SIMS Spectroscopies Y. Busby, Jean-Jacques Pireaux, University of Namur, Belgium |
10:00am | MC+AP+AS-MoM6 High Throughput Electron Diffraction-Based Metrology of Nanocrystalline Materials X. Liu, Carnegie Mellon University, D. Choi, Korea Railroad Research Institute, Republic of Korea, N.T. Nuhfer, Carnegie Mellon University, D.L. Yates, T. Sun, University of Central Florida, G.S. Rohrer, Carnegie Mellon University, K.R. Coffey, University of Central Florida, Katayun Barmak, Columbia University |
10:40am | MC+AP+AS-MoM8 Invited Paper LEIS Characterization of the Outer Surface, Ultra-Thin Layers and Contacts Hidde Brongersma, ION-TOF / Tascon / Calipso, Netherlands, P. Bruener, T. Grehl, ION-TOF GmbH, Germany, H.R.J. ter Veen, Tascon GmbH, Germany |
11:20am | MC+AP+AS-MoM10 Backside versus Frontside Characterization of High-k/Metal Gate Stacks for CMOS sub-14 nm Technological Nodes Eugenie Martinez, CEA, LETI, MINATEC Campus, France, B. Saidi, P. Caubet, F. Piallat, STMicroelectronics, France, H. Kim, CEA, LETI, MINATEC Campus, France, S. Schamm-Chardon, CEMES-CNRS, France, R. Gassilloud, CEA, LETI, MINATEC Campus, France |
11:40am | MC+AP+AS-MoM11 Charge Storage Properties of Al/(1-x)BaTiO3-xBa(Cu1/3Nb2/3)O3 (x = 0.025) (BTBCN)/HfO2/p-Si Metal/Ferroelectric/Insulator/Semiconductor Devices Souvik Kundu, M. Clavel, D. Maurya, M. Hudait, S. Priya, Virginia Tech |