| AVS 61st International Symposium & Exhibition | |
| Vacuum Technology | Monday Sessions |
| Session VT-MoA |
| Session: | Vacuum Measurement, Applications of UHV and Ultraclean Processes |
| Presenter: | Ivan Shchelkanov, University of Illinois at Urbana-Champaign |
| Authors: | I.A. Shchelkanov, University of Illinois at Urbana-Champaign A.M. Lietz, University of Illinois at Urbana-Champaign J. Pachicano, University of Illinois at Urbana-Champaign A. Antohe, SEMATECH P. Kearney, SEMATECH D.N. Ruzic, University of Illinois at Urbana-Champaign |
| Correspondent: | Click to Email |
We summarise the research accomplishments of the CPMI-SEMATECH research project “Identification of possible defect sources and particle characterisation from sources used in EUVL chambers for mask blank manufacturing”. The main goal of the project is the determination of nanoparticle production (100-350 nm in size) from the ion source currently used for mask blank manufacturing in EUV lithography chambers at SEMATECH. Combination of Volumetric Laser Scattering and Surface Laser Scattering system, and Scanning Electron Microscopy (SEM) was used to develop time resolved phenomenological model of nano-particle generation inside vacuum chamber during ion beam source operation. In this project a Veeco 3cm RF ion beam source with two molybdenum grids and RF neutralizer was investigated. Stiletto Volumetric Laser Scattering system developed by INFICON together with Surface Laser Scattering system, developed at CPMI were used to detect nano-particles. This combination of laser systems was able to detect particles with the size of 100 nm and bigger. Scanning Electron Microscopy was used to track evolution of the ion source grids surface. SEM photos of the grids and polished silicon wafers on the ion beam path were used to identify and characterize nano-particles via size, shape and material. Nano-paticle generation rate by the ion beam source was measured and recommendations for the source operation are made.