| AVS 61st International Symposium & Exhibition | |
| Plasma Science and Technology | Monday Sessions |
| Session PS-MoA |
| Session: | Advanced FEOL/Gate Etching |
| Presenter: | Chang-Jin Kang, Samsung Electronics, Republic of Korea |
| Correspondent: | Click to Email |
[Abstract]
Our current IT industry, which possesses a strong demand of personal mobile devices, is accelerating towards smart devices with the convergence of new technologies.
Under these circumstances, the development of semiconductors with high speed, high density, low power and high reliability are crucial. Scaling down of devices and to ensuring cost-effective technologies are the two most important tasks the semiconductor industry is facing.
To find proper solutions for the development of future devices and to overcome the limitations of current technologies, mid and long-term projections of future silicon technology as well as DRAM, NAND and Logic technology trends will be covered.