| AVS 60th International Symposium and Exhibition | |
| Thin Film | Thursday Sessions |
| Session TF-ThP |
| Session: | Thin Films Poster Session |
| Presenter: | D. Chiang, ITRC, NARL, Taiwan, Republic of China |
| Authors: | C.-T. Lee, ITRC, NARL, Taiwan, Republic of China D. Chiang, ITRC, NARL, Taiwan, Republic of China C.-Y. Su, ITRC, NARL, Taiwan, Republic of China M.-C. Liu, Minghsin University of Science and Technology, Taiwan, Republic of China C.-C. Jaing, Minghsin University of Science and Technology, Taiwan, Republic of China |
| Correspondent: | Click to Email |
The WO3C film was deposited on an ITO glass substrate at room temperature by DC reactive magnetron sputtering with W and C target. Effects of carbon concentration on the microstructure, surface morphology and optical properties of WO3C film were investigated by X-ray diffraction, field emission scanning electron microscopy, atomic force microscopy and spectrometer. X-ray diffraction analysis reveals that all of the as-deposited films are amorphous. The surface roughness of the WO3C film was increased with increasing carbon content from 0.73 nm to 1.29 nm. The average transmittance of coloured WO3C film in the visible region (400-700 nm) was decreased with increased carbon content from 0 at.% to 9.35 at%. The optimum average transmittance of about 76.2% and 7.9% during bleaching and coloration states in the visible light region (400-700 nm) with +3V and -3V applied.