AVS 60th International Symposium and Exhibition
    Thin Film Thursday Sessions
       Session TF-ThP

Paper TF-ThP1
Enhancement of Structural, Optical and Electrical Properties through Post-Annealing of N-doped ZnO Thin Films Grown by Reactive Magnetron RF-Sputtering

Thursday, October 31, 2013, 6:00 pm, Room Hall B

Session: Thin Films Poster Session
Presenter: L.A. Hernández-Hernández, ESFM-IPN, Mexico
Authors: L.A. Hernández-Hernández, ESFM-IPN, Mexico
A. Hernández-Hernández, CINVESTAV-IPN, Mexico
F. De Moure-Flores, UAQ, Mexico
J.S. Arias-Cerón, CINVESTAV-IPN, Mexico
J.G. Quiñones-Galván, ININ, Mexico
J. Aguilar-Hernández, ESFM-IPN, Mexico
G. Contreras-Puente, ESFM-IPN, Mexico
M. Meléndez-Lira, CINVESTAV-IPN, Mexico
Correspondent: Click to Email

Nitrogen doped zinc oxide thin films were grown on glass and silicon substrates by reactive magnetron RF sputtering of zinc in a N2O–Ar atmosphere, post-annealing treatment of samples was made in a nitrogen reactive atmosphere. We report a comparative study of as-grown and post-annealing treatment of N-doped ZnO thin films properties carried out by structural, optical, electrical and spectroscopic techniques. The characterization measurements allow us to confirm the improvement of crystalline quality, a higher incorporation of N, and the apparition of luminescence emission at room temperature and photoresponse in the visible range due to the post-annealing treatment of the samples.

: partially funded by CONACyT-Mexico.