AVS 60th International Symposium and Exhibition
    Thin Film Monday Sessions
       Session TF+AS+SE+SS-MoA

Paper TF+AS+SE+SS-MoA9
Molecular Layer Deposition of Organic-Inorganic Hybrid Materials for Implant BARC Applications

Monday, October 28, 2013, 4:40 pm, Room 104 A

Session: ALD/MLD Surface Reactions, Precursors, and Properties
Presenter: L.N.J. Rodriguez, IMEC, Belgium
Authors: L.N.J. Rodriguez, IMEC, Belgium
C. Adelmann, IMEC, Belgium
B. Sutens, IMEC, Belgium
G. Winroth, IMEC, Belgium
A. Delabie, IMEC, Belgium
R. Gronheid, IMEC, Belgium
S. Van Elshocht, IMEC, Belgium
Correspondent: Click to Email
Molecular Layer Deposition (MLD), a variant of Atomic Layer Deposition (ALD) whereby organic groups are used to link the metal atoms within the growing film can create films with optical properties which are unreachable by ALD alone. The ability to make highly conformal films of specified thickness and optical properties should be of use in supplying Bottom Anti-Reflective Coatings (BARC) for lithography processes. The advantage lies in finely tuned patterning control, minimising etch damage to the underlying topography in applications such as ion implantation masking. Optical simulations were performed for a 110nm trench using 193nm exposure at 0.85NA with conventional illumination and with the MLD thickness of 5nm and having n=1.4 and k=0.8, in order to validate this approach. The growth rate of alucones by MLD was highly dependent on the temperature but did show self-limiting growth. While the refractive index of the alucones is lowered towards the target region, the absorption constant was too low. Therefore the ethylene glycol in the MLD was replaced with aromatic precursors so as to increase the optical absorption of the films. The conformallity of the films was tested with fin structures and the process developed for transfer from coupons to full wafers.