| AVS 60th International Symposium and Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
| Session PS-ThA |
| Session: | Low Damage Processing |
| Presenter: | D.R. Boris, Naval Research Laboratory |
| Authors: | D.R. Boris, Naval Research Laboratory E.H. Lock, Naval Research Laboratory R.F. Fernsler, Naval Research Laboratory S.G. Walton, Naval Research Laboratory |
| Correspondent: | Click to Email |
Electron beam generated plasmas have a variety of unique features that make them distinctive plasma sources for materials processing. They are characterized by high plasma density, very low electron temperature, and unique gas phase chemistries that distinguish them from discharge based plasmas. This work presents measurements from suite of diagnostics (RF impedance probes and Langmuir probes, optical emission spectroscopy (OES), and energy resolving mass spectrometer) used to characterize the unique features of electron beam generated plasmas. The focus will be on the important role that gas chemistry plays in determining plasma parameters (kTe, Vp, ion energy distribution) and the resulting flexibility of the processing system.