AVS 60th International Symposium and Exhibition
    Plasma Science and Technology Monday Sessions
       Session PS+AS+BI+SE-MoM

Invited Paper PS+AS+BI+SE-MoM1
Field Emission in Microscale Dimensions: A New Approach to Atmospheric Pressure Gas Discharges

Monday, October 28, 2013, 8:20 am, Room 102 B

Session: Atmospheric Plasma Processing: Fundamental and Applications
Presenter: D.B. Go, University of Notre Dame
Authors: Y. Li, University of Notre Dame
P. Rumbach, University of Notre Dame
D.B. Go, University of Notre Dame
Correspondent: Click to Email
Electron field emission is traditionally considered a low-pressure phenomenon and most field emission-based technologies, such as scanning electron microscopes, generate field emission under high vacuum conditions. However, over the course of past decade, a advances in microscale devices have led to the field emission devices that operate at high pressures, including at and near to atmospheric pressure. At these pressures, the field-emitted electrons can ionize the interstitial gas between the electrodes, leading to the formation of gas discharges. With emerging applications in gas sensing and gas reforming, this new approach to gas discharges not only introduces new, interesting physics but also offers many new technological opportunities. This work will focus on the theory and generation of stable, field emission-driven Townsend discharges. The physical concepts underpinning these discharges will be discussed as theoretical and modeling efforts have highlighted many significant features of this discharge mode – including very high electron densities (~1014 cm-3) and highly non-Maxwellian electron densities. Experimental studies and the role of the cathode material will also be discussed as evidence of pressure scaling for field emission will be presented. Finally, new applications and future opportunities for discovery will be covered.