AVS 60th International Symposium and Exhibition
    Helium Ion Microscopy Focus Topic Thursday Sessions
       Session HI-ThA

Paper HI-ThA7
Helium Ion Microscopy of CVD-grown Films: Transition Metals and Catalytically Active Transition Metal Oxides

Thursday, October 31, 2013, 4:00 pm, Room 203 A

Session: Imaging and Lithography with Helium Ions
Presenter: H. Vieker, Bielefeld University, Germany
Authors: H. Vieker, Bielefeld University, Germany
A. Beyer, Bielefeld University, Germany
Z.-Y. Tian, Bielefeld University, Germany
P. Mountapmbeme Kouotou, Bielefeld University, Germany
A. El Kasmi, Bielefeld University, Germany
K. Kohse-Höinghaus, Bielefeld University, Germany
A. Gölzhäuser, Bielefeld University, Germany
Correspondent: Click to Email
Pulsed spray evaporation – chemical vapor deposition (PSE-CVD) is a cheap and scalable route to prepare specifically engineered layers, e.g. metallic and metal oxide films. The latter type is a promising class of materials for developing new efficient catalysts. Such developments require a detailed analysis of the surface morphology which significantly affects the catalytic activity. Among other methods, we employed helium ion microscopy to investigate such films. The high resolution and the high depth of focus are very advantageous in imaging these highly corrugated surfaces. We revealed extremely small surface structures which yield new insights in the morphology of these films. In this study, changes in the morphology of metallic as well as metal oxide PSE-CVD layers by varying the deposition temperature, precursor type, pressure and composition were investigated which leads to a better understanding of the involved growth processes and the catalytic activity.