| AVS 60th International Symposium and Exhibition | |
| Applied Surface Science | Thursday Sessions |
| Session AS-ThP |
| Session: | Applied Surface Science Poster Session |
| Presenter: | D.F. Paul, Physical Electronics Inc. |
| Correspondent: | Click to Email |
Recent improvements of field emission scanning Auger instruments have led to the ability to provide elemental imaging of surfaces with a spatial resolution better than 8 nm. The PHI 710 now provides the capability to combine high energy resolution spectra with high spatial resolution chemical state imaging with a CMA analyzer. The system software also provides LLS separation of different chemical states from the Auger imaging data.
A semiconductor structure with multiple silicon chemical states will be presented. The 0.1% energy resolution spectra for silicide, silicon, and silicon oxynitride are extracted from the scanning Auger image. These basis spectra are then used to create the different chemical state images. The resulting image overlays demonstrate the ability of the CMA analyzer to image different chemical states at high energy resolution without topographical artifacts.