AVS 60th International Symposium and Exhibition
    Applied Surface Science Thursday Sessions
       Session AS-ThP

Paper AS-ThP5
In Situ Plasma Cleaning of Samples Prior to XPS and ToF-SIMS Analysis

Thursday, October 31, 2013, 6:00 pm, Room Hall B

Session: Applied Surface Science Poster Session
Presenter: V. Smentkowski, General Electric Global Research Center
Authors: V. Smentkowski, General Electric Global Research Center
H. Piao, General Electric Global Research Center
Correspondent: Click to Email
Most samples submitted for surface analysis using Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS) and/or time of flight secondary ion mass spectrometry (ToF-SIMS) that are generated in an industrial laboratory are exposed to ambient air, or harsher conditions. The spectra of the as received material is often dominated by carbon and oxygen or hydrocarbon species when analyzed by AES/XPS or ToF-SIMS respectively. These surface contaminants frequently attenuate the signal from the underlying surface of interest and can complicate accurate analysis of the sample. Such surface contaminants are often removed from samples using in-situ ion beam sputtering however sputtering is an energetic process which can modify the surface of interest. In this work, we demonstrate the benefits of using in-situ, low power, RF plasmas to clean a variety of samples for both XPS and ToF-SIMS analysis.