| AVS 59th Annual International Symposium and Exhibition | |
| Advanced Surface Engineering | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | SE+PS-TuM1 Invited Paper Strong Localization of Ionization in High Power Impulse Magnetron Sputtering in Reactive and Non-Reactive Gas Environments A. Anders, Lawrence Berkeley National Laboratory |
| 8:40am | SE+PS-TuM3 The Magnetic Field Configuration’s Effect on Plasma Parameters in High-Power Pulsed Magnetron Sputtering H. Yu, L. Meng, P. Raman, T.S. Cho, D.N. Ruzic, University of Illinois at Urbana Champaign |
| 9:00am | SE+PS-TuM4 Plasma Generation and Transport in High-Power Pulsed Magnetron Sputtering L. Meng, H. Yu, T.S. Cho, D.N. Ruzic, University of Illinois at Urbana Champaign |
| 9:20am | SE+PS-TuM5 Metallic Film Modification through the Use of Non-standard HiPIMS Waveforms P.M. Barker, E. Lewin, J. Patscheider, EMPA, Switzerland |
| 10:40am | SE+PS-TuM9 Reactive Modulated Pulse Power Magnetron Sputtering of Molybdenum Oxides: Optical Behavior as a Function of Process Parameters N.R. Murphy, Air Force Research Laboratory, L. Sun, General Dynamics Information Technology, J.T. Grant, University of Dayton Research Institute, J.G. Jones, R. Jakubiak, Air Force Research Laboratory |
| 11:00am | SE+PS-TuM10 Cathodic Arc Plasma of AlCr Composite Cathodes in Inert and Reactive Atmospheres R. Franz, J. Wallig, Lawrence Berkeley National Laboratory, P. Polcik, PLANSEE Composite Materials GmbH, Germany, A. Anders, Lawrence Berkeley National Laboratory |