| AVS 59th Annual International Symposium and Exhibition | |
| Advanced Surface Engineering | Tuesday Sessions |
| Session SE+PS-TuM |
| Session: | Pulsed Plasmas in Surface Engineering |
| Presenter: | N.R. Murphy, Air Force Research Laboratory |
| Authors: | N.R. Murphy, Air Force Research Laboratory L. Sun, General Dynamics Information Technology J.T. Grant, University of Dayton Research Institute J.G. Jones, Air Force Research Laboratory R. Jakubiak, Air Force Research Laboratory |
| Correspondent: | Click to Email |
Molybdenum oxide, a material prized for its ability to facilitate thermochromism and electrochromism, has displayed considerable sensitivity to oxygen concentrations present during reactive DC magnetron sputtering. Typical depositions performed using continuous reactive DC magnetron sputtering have demonstrated low deposition rates and limited control over stoichiometry as a result of oxygen induced target poisoning. In the following study, molybdenum oxide films were deposited using reactive modulated pulse power magnetron sputtering (MPPMS) using a 99.999% pure molybdenum sputtering target within an argon-oxygen atmosphere. At a pressure of 10 mTorr, the oxygen concentration was varied between 1 and 20%. The resulting films were characterized by way of in-situ spectroscopic ellipsometry, x-ray photoelectron spectroscopy, x-ray diffraction and UV-visible spectroscopy. The as-deposited films were determined to be amorphous by way of x-ray diffraction analysis and were analyzed without any prior heat treatment. In-situ spectroscopic ellipsometry was conducted throughout the deposition process, monitoring real time changes in the refractive index, extinction coefficient and thickness of the film.