| AVS 59th Annual International Symposium and Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS1-WeA1 ECR Plasma Etching Characterization using a Retarding Field Energy Analyzer B. Dolinaj, Dublin City University, Ireland, V. Milosavljevic, Dublin City University, D. Gahan, Impedans Ltd., N. MacGearailt, Intel Corporation, M.B. Hopkins, Impedans Ltd., S. Daniels, Dublin City University |
| 2:20pm | PS1-WeA2 Time Resolved Ion Flux Measurement in Pulsed ICP Plasmas G. Cunge, M. Darnon, LTM-CNRS, France, N.St. Braithwaite, The Open University, UK, E. Despiau-Pujo, P. Bodart, M. Brihoum, M. Haass, O. Joubert, LTM-CNRS, France |
| 2:40pm | PS1-WeA3 In Situ Monitoring of Electron Density and Dielectric Layer on the Wall with Curling Probe A. Pandey, Y. Liang, S. Ikezawa, K. Nakamura, H. Sugai, Chubu University, Japan |
| 4:00pm | PS1-WeA7 Invited Paper Time Resolved Laser Induced Fluorescence for Probing the Excitation Kinetics of a Low Temperature Argon Discharge J.M. Palomares Linares, E.A.D. Carbone, S. Hübner, W.A.A.D. Graef, J.J.A.M. van der Mullen, Eindhoven University of Technology, the Netherlands |
| 4:40pm | PS1-WeA9 Analysis of Run-to-Run Variability in the Bosch Process using rf Probe and Emission Spectroscopy Measurements M. Fradet, L. Stafford, Université de Montréal, Canada, C. Coïa, Teledyne Dalsa, Canada |
| 5:00pm | PS1-WeA10 Spatially-resolved Optical Emissions Spectroscopy of Capacitively Coupled Discharges G. Franz, I. Krstev, F. Schamberger, Hochschule München, Germany |
| 5:20pm | PS1-WeA11 Model-based Ion Energy Control in ICP Etcher M. Klick, Plasmetrex, Germany, H.P. Maucher, United Monolithic Semiconductors |
| 5:40pm | PS1-WeA12 High Energy IED Measurements with MEMs based Si Grid Technology Inside a 300mm Si Wafer M. Funk, B.G. Lane, L. Chen, J. Zhao, R. Sundararajan, Tokyo Electron America, Y. Yamazawa, Tokyo Electron Limited, Japan |