AVS 59th Annual International Symposium and Exhibition
    Thin Film Thursday Sessions
       Session TF+NS+EM-ThM

Paper TF+NS+EM-ThM5
Investigation of Precursor Infiltration and ALD Growth on Polymers and Effect on Fiber Mechanical Properties

Thursday, November 1, 2012, 9:20 am, Room 11

Session: Thin Films: Growth and Characterization-II
Presenter: R.P. Padbury, North Carolina State University
Authors: R.P. Padbury, North Carolina State University
J.S. Jur, North Carolina State University
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Atomic layer deposition (ALD) provides the opportunity to unite the properties of organic fiber forming polymers and nanoscale inorganic films creating a hybrid material interface. Prior research has shown that ALD materials nucleation on polymers varies in composition and structure based on how the precursor interacts with the polymer chemistry and the process conditions. The purpose of this work is to explore the effect of this processing on the mechanical behavior of fibrous materials. To study this in more detail, in-situ quartz crystal microgravimetry (QCM) is employed to understand the material growth mechanisms of ALD TiO2, ZnO, and Al2O3 on poly (acrylic acid), polyamide-6, and polyethylene terephthalate. Particular emphasis is placed on controlling the ALD precursor diffusion into the sub-surface region of these polymers. In-situ QCM data was complemented by ex-situ characterization methods such as FT-IR and TEM to examine the interaction between the precursor and polymer and the compositions of the inorganic films. Finally, these results are correlated to the mechanical performance of the ALD treated fabrics. This work has important implications on sustainable textiles processes as well as the introduction of hybrid material properties to textile systems.