AVS 59th Annual International Symposium and Exhibition
    Plasma Science and Technology Monday Sessions
       Session PS+EM-MoM

Invited Paper PS+EM-MoM1
Plasma Science and Applications in the Spatial Realm Below 1 mm: Recent Advances in Microcavity/Microchannel Plasmas

Monday, October 29, 2012, 8:20 am, Room 24

Session: Atmospheric Plasma Processing and Micro Plasmas
Presenter: J.G. Eden, University of Illinois at Urbana Champaign
Correspondent: Click to Email
The last decade has witnessed the rapid emergence of microcavity plasmas, a new subfield of plasma science and technology that pursues the fundamental physics and applications of low temperature, nonequilibrium plasma confined in at least one dimension to nominally < 1 mm. By melding plasma science with photolithography and other micro/nanofabrication techniques adapted from the integrated circuits and materials science communities, it has become possible to observe plasma behavior and realize electronic/photonic/chemical devices that were inaccessible previously. With all due respect to Captain Kirk, plasmas are now able “to go where no [plasma] has gone before.” This presentation will highlight recent advances in microcavity plasma science, such as the realization of plasma confined to < 3 µm. Interfacing a gas phase (e- – ion) plasma with an e- – h+ plasma in a semiconductor to yield an n+pn plasma bipolar junction transistor will be described. A new form of thin, flat lighting (“lighting tiles”) available in sheets as large as 900 cm2 in area will be demonstrated, and massively-parallel plasmachemical processing of gases/vapors in arrays of microchannel plasmas will be described.