As the demand for higher densities in microelectronic devices increase, the strain on current lithographic technologies becomes great. To achieve greater performance, smaller feature sizes are necessary and will require innovative lithographic technologies. One technique, called Nanoimprint Lithography (NIL) differs from traditional lithography in the exposure and development process, which is replaced by a process in which a resist on a substrate is imprinted by a patterned mold. The nano-scale reproducible patterns allow for a high-throughput technique that saves much processing time and cost. At the UCLA NRF, we are developing baseline recipes for producing nanoscale pattern transfers using PMMA and mr-I (Micro Resist Technologies) polymers. The ability to mass produce nanoscale patterns (C.D.<100 nm) will have a great impact on projects ranging from microelectronics to bioengineering. Using the NIL techniques learned at the UCLA NRF, two target applications have emerged. The cost effective means to produce nanoscale

patterns has made it possible to readily investigate; block copolymer (BCP) lithography and nanoimprint assisted DNA sequencing.