Invited Paper MN-TuM3
Focused Ion Beam Fabrication for Nanophotonics and Microsystems Integration
Tuesday, October 30, 2012, 8:40 am, Room 10
Focused ion beam (FIB) fabrication has become an invaluable tool to pattern nanoscale features on a vast range of materials otherwise not available due to the limitations on selectivity of chemical based reactions for etching. In addition, direct milling to create features allows precision patterning on a variety of surface topology. In this talk, we present work on using the FIB to pattern and integrate nanophotonic elements, e.g. photonic crystals, and microelectromechanical systems for novel device applications. In addition, we explore how the FIB can also be used for applications in integration of microsystems with plasmonic structures to achieve precision control of light-matter interactions at the nanoscale.