AVS 59th Annual International Symposium and Exhibition
    Spectroscopic Ellipsometry Focus Topic Monday Sessions
       Session EL+TF+BI+AS+EM+SS-MoA

Invited Paper EL+TF+BI+AS+EM+SS-MoA6
Detailed Photoresist and Photoresist Processing Studies using Spectroscopic Ellipsometry

Monday, October 29, 2012, 3:40 pm, Room 19

Session: Spectroscopic Ellipsometry: From Organic and Biological Systems to Inorganic Thin Films
Presenter: C. Henderson, Georgia Institute of Technology
Correspondent: Click to Email
Spectroscopic ellipsometry has become an invaluable tool for the study of a wide variety of thin film systems. In particular, it has become extremely valuable in the development and study of advanced photoresists and of lithographic processes used in the production of integrated circuits and other related semiconductor devices. In our work, we have used spectroscopic ellipsometry to study a variety of problems related to photoresists including swelling phenomena, exposure induced refractive index changes, and ultra-fast dissolution phenomena. We have combined spectroscopic ellipsometry with quartz crystal microbalance techniques to simultaneously study thin film optical properties, thickness, film mass, and film modulus. Such techniques have been particularly useful in understanding the dissolution properties of polymeric photoresists developed for 193 nm lithography. This talk will review some of the applications for spectroscopic ellipsometry in this field and in particular will highlight some of the results of our work made possible using spectroscopic ellipsometry.