AVS 58th Annual International Symposium and Exhibition
    Plasma Science and Technology Division Tuesday Sessions

Session PS2-TuA
Plasma Diagnostics, Sensors and Control I

Tuesday, November 1, 2011, 2:00 pm, Room 201
Moderator: Vladimir Nagorny, Mattson Technology, Inc.


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm PS2-TuA1
Prediction of Ion Sheath Shape and Ion Trajectory during Plasma Etching Processing using On-Wafer Monitoring Technique
Ryosuke Araki, K. Miwa, T. Kubota, Tohoku University, Japan, T. Iwasaki, K. Ono, Mizuho Information & Research Institute, Inc., Japan, S. Samukawa, Tohoku University, Japan
2:20pm PS2-TuA2
Measuring Electron Density, Electron Temperature, and Plasma Potential with RF Frequency Probes
Dave Boris, R.F. Fernsler, S.G. Walton, Naval Research Laboratory (NRL)
2:40pm PS2-TuA3
Effects of Wire Thickness, Neutral Pressure and Gas Composititon on the Inflection Point Technique
Bordin Dechawatanapisal, N. Hershkowitz, J.P. Sheehan, CS. Yip, University of Wisconsin-Madison
3:00pm PS2-TuA4
A New Diagnostic Tool System of Radio- Frequency Plasmas by Employing Floating-Emissive Probe
Yasuyuki Taniuchi, M. Utsumi, Tokai University, Japan, M. Yanagisawa, Landmark Technology Corporation, Japan, H. Shindo, Tokai University, Japan
4:00pm PS2-TuA7
A Comparison of Emissive Probe Techniques for Electric Potential Measurements in a Complex Plasma
J.P. Sheehan, University of Wisconsin-Madison, Y. Raitses, Princeton Plasma Physics Laboratory, N. Hershkowitz, University of Wisconsin-Madison, I. Kaganovich, N.J. Fisch, Princeton Plasma Physics Laboratory
4:20pm PS2-TuA8
Probe Diagnostics Instrument for Laboratory and Industrial RF Plasmas
Valery Godyak, RF Plasma Consulting
4:40pm PS2-TuA9
Ion Energy Distributions in Pulsed Plasmas with Synchronous DC Bias: Effect of Noble Gas
Weiye Zhu, H. Shin, V.M. Donnelly, D.J. Economou, University of Houston
5:00pm PS2-TuA10 Invited Paper
2011 AVS John A. Thornton Award Lecture - As Device Dimensions Continue to Shrink… A Journey Through Thirty Years of Plasma Etching Diagnostics and Mechanisms
Vincent Donnelly, University of Houston