Paper EW-TuL4
Optimized XPS Depth Profiling of Organic Materials using Polyatomic Ion Sources

Tuesday, November 1, 2011, 1:00 pm, Room West Exhibit Hall

Over the last several years multiple methods have developed for the depth profile analysis of organic materials using a variety of different polyatomic species as the sputtering ion. It has also become clear that different classes of polymers require quite different sputtering parameters to be effectively profiled with no loss of chemical information. In this presentation we discuss a variety of approaches that have developed in order to effectively sputter profile a wide range of materials. These approaches utilize differences in ion beam energy, impact angle and sample temperature in order to achieve an effective sputter profile.